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Equation 12 · Part 2 · How Advanced Semiconductor Fabrication Actually Works

Symbol mu

Cpk=min⁡(USL−μ3σ, μ−LSL3σ),C_{pk} = \min\left(\frac{\mathrm{USL} - \mu}{3\sigma},\ \frac{\mu - \mathrm{LSL}}{3\sigma}\right),
μ\mu

What this part means

mu occurs above the fraction bar. The numerator is divided by the entire denominator below it.

Its job in the formula

mu occurs above the fraction bar. The numerator is divided by the entire denominator below it.

The passage around this formula

…that something about the process, not the sample, has changed [ 10 ] . Alongside the chart sits a single summary number, the process capability index, Cpk=min⁡(USL−μ3σ, μ−LSL3σ)C_{pk} = \min\left(\frac{\mathrm{USL} - \mu}{3\sigma},\ \frac{\mu - \mathrm{LSL}}{3\sigma}\right). comparing the distance from the process mean μ\mu to its nearer specification limit against three standard deviations of the process’s own spread. A CpkC_{pk} at or above about 1.33 is generally treated as acceptable capability, 1.67 or above as excellent, and below 1.0 as a process that cannot reliably meet its own specification even when…

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A variable is a named place for a value. Its letter is a local label: x can mean position in one formula and a data point in another.

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Sources cited in the surrounding passage

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