Equation 1 · Part 2 · Patterning at the Limit: What Actually Happens When a Chip Is Manufactured

Symbol k_1

R = k_1 \frac{\lambda}{\mathrm{NA}},

k_1

What this part means

a dimensionless process factor absorbing illumination scheme, mask engineering and resist behaviour.

Its job in the formula

$k_1$ is an input to the expression that computes the quantity on the left.

Full expressionSymbol k_1Article meaning

Where the article explains it

where $\lambda$ is the exposure wavelength, $\mathrm{NA}$ is the numerical aperture of the projection optics, and $k_1$ is a dimensionless process factor absorbing illumination scheme, mask engineering and resist behaviour.

The passage around this formula

…lithography is an imaging problem, and its resolution obeys the Rayleigh relation $R = k_1 \frac{\lambda}{\mathrm{NA}}$ . where $\lambda$ is the exposure wavelength, $\mathrm{NA}$ is the numerical aperture of the projection optics, and $k_1$ is a dimensionless process factor absorbing illumination scheme, mask engineering and resist behaviour. Two-beam interference sets a hard floor: for a periodic line-and-space pattern the smallest printable half-pitch is $\lambda$ / (2\, $\mathrm{NA}$ ) , which is $k_1$ = 0.25 in the convention where R…

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Learn the underlying idea

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Sources cited in the article section

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