Equation 2 · Part 1 · Comparing the Main Approaches to Advanced Semiconductor Fabrication
Symbol σ
What this part means
σ is a part of this expression. Its role is fixed by the surrounding article and by the operations shown in the formula.
Its job in the formula
σ is a part of this expression. Its role is fixed by the surrounding article and by the operations shown in the formula.
Full expression→Symbol σ→Article meaning
The passage around this formula
…N separately printable exposures — as litho-etch-litho-etch and self-aligned multiple patterning both do, in different ways — and each exposure contributes an independent, zero-mean placement error of standard deviation , the layer’s overlay-driven placement uncertainty combines in quadrature:
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Sources cited in the article section
- [4] The case for High NA EUV: unlocking the next era of chip manufacturing ↗
- [3] International Roadmap for Devices and Systems 2023 Update: Lithography and Patterning ↗
- [6] TWINSCAN EXE:5000 ↗
- [7] 5 things you should know about High NA EUV lithography ↗
These citations provide research context; check each source for the exact claim it supports.